Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
-
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
-
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
-
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
1
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
SC-62/2-5K1A
2.5mm
Surface mount technology
1.4mm
1.5mm
1.6mm
3
-
1