Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
-
150Cel
1
0
1
-150mA
200mW
200
400
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-150mA
150mW
200
400
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-150mA
150mW
200
400
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
-
150Cel
1
0
1
-150mA
200mW
70
140
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-150mA
150mW
70
140
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-150mA
150mW
70
140
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
-
150Cel
1
0
1
-150mA
200mW
120
240
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-150mA
150mW
120
240
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Bipolar Transistors Silicon PNP Epitaxial Type
Mass production
S-Mini/2-3F1S
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-150mA
150mW
120
240
-0.1V
-0.3V
-100mA
-50V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-100mA
150mW
350
700
-0.3V
-10mA
-120V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
150Cel
1
0
1
-100mA
200mW
350
700
-0.3V
-10mA
-120V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-100mA
150mW
200
400
-0.3V
-10mA
-120V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
150Cel
1
0
1
-100mA
200mW
200
400
-0.3V
-10mA
-120V
PNP
1dB
10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-500mA
150mW
70
400
-0.1V
-0.25V
-100mA
-30V
PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
150Cel
1
0
1
-500mA
200mW
70
400
-0.1V
-0.25V
-100mA
-30V
PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-500mA
150mW
25
140
-0.1V
-0.25V
-100mA
-30V
PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
150Cel
1
0
1
-500mA
200mW
25
140
-0.1V
-0.25V
-100mA
-30V
PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
125Cel
1
0
1
-500mA
150mW
40
240
-0.1V
-0.25V
-100mA
-30V
PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
TO-236MOD/SC-59/2-3F1A
2.9mm
1.5mm
1.1mm
Surface mount technology
0.95mm
3
○
150Cel
1
0
1
-500mA
200mW
40
240
-0.1V
-0.25V
-100mA
-30V
PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS
Silicon PNP Epitaxial Type (PCT process)
Mass production
SC-62/2-5K1A
2.5mm
Surface mount technology
1.4mm
1.5mm
1.6mm
3
-
150Cel
1
0
1
-800mA
500mW
80
160
-1V
-500mA
-120V
PNP