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Package type
Body length[Typ]
Body breadth[Typ]
Body height[Typ]
Mounting method
Pin Pitch[Min]
Pin Pitch[Typ]
Pin Pitch[Max]
Number of terminals[Nom]
AEC compliant
Junction temperature[Max] (Cel)
Number of transistors[Nom]
Number of NPN transistors[Nom]
Number of PNP transistors[Nom]
Collector current (DC)[Max] (A)
Collector-emitter power dissipation[Max] (W)
DC current gain[Min]
DC current gain[Max]
Collector-emitter saturation voltage 1[Typ] (V)
Collector-emitter saturation voltage 1[Max] (V)
Collector-emitter saturation voltage 2[Typ] (V)
Collector-emitter saturation voltage 2[Max] (V)
Collector-emitter saturation voltage 3[Typ] (V)
Collector-emitter saturation voltage 3[Max] (V)
Collector-emitter voltage[Max] (V)
TR polarity
Applied filter
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Toshiba Corporation Semiconductor

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Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 - 150Cel 1 0 1 -150mA 200mW 200 400 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -150mA 150mW 200 400 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -150mA 150mW 200 400 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 - 150Cel 1 0 1 -150mA 200mW 70 140 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -150mA 150mW 70 140 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -150mA 150mW 70 140 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 - 150Cel 1 0 1 -150mA 200mW 120 240 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -150mA 150mW 120 240 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Bipolar Transistors Silicon PNP Epitaxial Type Mass production S-Mini/2-3F1S 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -150mA 150mW 120 240 -0.1V -0.3V -100mA -50V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -100mA 150mW 350 700 -0.3V -10mA -120V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 150Cel 1 0 1 -100mA 200mW 350 700 -0.3V -10mA -120V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -100mA 150mW 200 400 -0.3V -10mA -120V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 150Cel 1 0 1 -100mA 200mW 200 400 -0.3V -10mA -120V PNP 1dB 10dB
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -500mA 150mW 70 400 -0.1V -0.25V -100mA -30V PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 150Cel 1 0 1 -500mA 200mW 70 400 -0.1V -0.25V -100mA -30V PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -500mA 150mW 25 140 -0.1V -0.25V -100mA -30V PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 150Cel 1 0 1 -500mA 200mW 25 140 -0.1V -0.25V -100mA -30V PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 125Cel 1 0 1 -500mA 150mW 40 240 -0.1V -0.25V -100mA -30V PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production TO-236MOD/SC-59/2-3F1A 2.9mm 1.5mm 1.1mm Surface mount technology 0.95mm 3 150Cel 1 0 1 -500mA 200mW 40 240 -0.1V -0.25V -100mA -30V PNP
Toshiba Corporation Semiconductor
GENERAL PURPOSE BIPOLAR TRANSISTORS Silicon PNP Epitaxial Type (PCT process) Mass production SC-62/2-5K1A 2.5mm Surface mount technology 1.4mm 1.5mm 1.6mm 3 - 150Cel 1 0 1 -800mA 500mW 80 160 -1V -500mA -120V PNP